Why sputtering is called magnetron sputtering?

When these electrons collide with a process gas atom they strip the gas atom of an electron creating a positively charged process gas ion.The positively charged ion is accelerated toward the magnetron. This ion carries enough energy with it to “knock off” or “sputter” some of the magnetrons target material.

Is magnetron sputtering PVD?

Magnetron sputtering coating is a vacuum coating process that falls under the category of physical vapor deposition (PVD) and is mainly used for depositing metals, alloys, and compound textiles, and other material with a thickness up to 5μ.

What is the process of sputtering?

Sputtering is a plasma based deposition process in which energetic ions are accelerated towards a target. The ions strike the target and atoms are ejected (or sputtered) from the surface. These collisions cause an electrostatic repulsion which ‘knock off’ electrons from the sputtering gas atoms, causing ionization.

What is reactive magnetron sputtering?

Reactive magnetron sputtering is a well-established physical vapor technique to deposit thin compound films on different substrates, ranging from insulating glass windows over wear-resistant car parts to high-responsive touch screens.

How is magnetron sputtering done?

Magnetron sputtering increases the plasma density by introducing a magnetic field on the surface of the target cathode and utilizing the constraints of the magnetic field on the charged particles to increase the sputtering rate.

What happens to electrons in a sputter coater discharge?

The magnetic lines of force cause enclosed loops at the target surface, increasing the interaction path length of the high energy electrons in the discharge. Deflection and retardation of electrons result in increased ion yield and sputtering efficiency.

Where does the energy that causes sputtering come from?

The ions that cause sputtering come from a variety of sources — they can come from plasma, specially constructed ion sources, particle accelerators, outer space (e.g. solar wind), or radioactive materials (e.g. alpha radiation).

What causes sputtering in a linear collision cascade?

Physical sputtering is driven by the momentum exchange between the ions and atoms in the target materials, due to collisions. Sputtering from a linear collision cascade. The thick line illustrates the position of the surface, and the thinner lines the ballistic movement paths of the atoms from beginning until they stop in the material.

What does the thick line in a sputtering Cascade mean?

Sputtering from a linear collision cascade. The thick line illustrates the position of the surface, and the thinner lines the ballistic movement paths of the atoms from beginning until they stop in the material. The purple circle is the incoming ion.

What does it mean when your water faucet is sputtering?

Air in the Lines. Sputtering accompanied by cloudy, but not colored water often indicates air in your water pipes. This is caused by air bubbles in the water and occurs in the winter because of extremely cold temperatures, or during periods of high demand, such as summer heat waves, where the water is moving at high volumes to accommodate demand.

What causes air to discharge from a faucet?

This article series describes the causes of air discharging from building water supply piping or plumbing fixtures or the sources of excess air in water pressure tanks, water supply piping, or other plumbing fixtures.

Which is the best definition of a sputtering source?

The sputtering source can be an element, alloy, mixture, or a compound and the material is vaporized with the bulk composition of the target. The sputtering target provides a long-lived vaporization source that can be mounted so as to vaporize in any direction.